Preforma Unifex^® AW system, a 12 inch atomiclayer deposition equipment independently developed by AMEC, is designed to meet three dimen-stional structure and complex structure tungsten-fil requirements in advanced devices. This system inherts advantages of previous Preforma Uniflex^® CW products which can flexibly configure up to 5 dual station process chambers (total 10 stations), each chamber is capable of process-ing two wafers simultaneously, ensuring lower production cost and chemical consumption while achieving higher production-eficiency. What'smore, each chamber is compatible for both nucleation and bulk growth process, which provides more fexibility for configuration optimization according to customized process conditions, therefore further improving productivity performance. With utlization of AMEC-proprietary developed ultra-fast gas switching system, Preforma Uniflex^® AW can precisely control each process step,ensuring atomic levelfim growth, thus achieving tungsten film deposited of lowimpurity concentration and excelentstep coverage. This equipmentalso introduces unique gas delivery system design, further enhancing the gapfll capability, making itextendable to more advanced nodes. This system also inherits AMEC optimized flow and thermal field design, ensuring good film uniformity and process tuning flexibility.