Preforma Uniflash^® TaN system, a 300mm ALD product developed by AMEC independently, can adequately meet requirements of multiple applications in logic and memory devices. With AMEC's unique dual-station design, it can be configured with up to five dual-station chambers (totally 10 stations) to simultaneously realize high wafer throughput and provide configuration flexibility based on customer capacity. By employing AMEC's original temperature control system design, multi-zone flow channel design, multi-source supply system design and special chamber design enabling fast gas exchange, it can satisfy performance requirements from advanced logic and memory customers and guarantee internationally preeminent contami-nation control, film uniformity and productivity.