Preforma Uniflash® TiN system, a 300mm ALD product developed by AMEC independently, can adequately meet requirements of metal gate and liner applications in advanced logic and memory devices. With AMEC's unique dual-station design, it can be flexibly configured with up to five dual-station chambers (totally 10 stations)to simultaneously realize both integrated process solutions under high-vacuum and high wafer throughput. By employing AMEC's proprietary multi-level gas mixer design,simulation-based heater system design, and chamber gas conductance design specifically optimized for high-efficiency ALD reaction, it can satisfy strict performance requirements from advanced logic customers and guarantee internationally preemi-nent film uniformity, contamination control and productivity.
A 300mm ALD product developed by AMEC
Dual-station chamber and system configured with up to five dual-station chambers enable high wafer throughput
AMEC' s proprietary multi-level gas mixer and chamber gas conductance design
Heater system design based on simulation
Integrated design originated from AMEC enables high-efficiency gas delivery and purge
High throughput and low cost-of-ownership (CoO)
Superior contamination control
Better WiW and WtW uniformity
Excellent step coverage on multiple complex structures
Significantly increased mean wafer between clean (MWBC)
