Preforma Uniflash^® TiAl system, a 300mm ALD product developed by AMEC independenty, can adequately meet requirements of metal gate applications in advanced logic devices. With AMEC' s unique dual-station design, it can be flexibly configured with up to five dual-station chambers (totally 10 stations) to simultaneously realize both integrated process solutions under high-vacuum and high wafer throughput. By employing AMEC's original temperature control system design, special surface treatment technique, multi-zone gas distribution system design, and simulation-based heater system design, it can satisfy strict performance requirements from advanced logic customers and guarantee internationally preeminent contamination control, film uniformity and productivity.